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Comparison of the performance of slurries for STI processing

dc.contributor.authorDetzel, T.
dc.contributor.authorHosali, S.
dc.contributor.authorSethuraman, A.
dc.contributor.authorWang, J. F.
dc.contributor.authorCook, L.
dc.contributor.authorGrillaert, Joost
dc.date.accessioned2021-09-30T08:12:51Z
dc.date.available2021-09-30T08:12:51Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1859
dc.sourceIIOimport
dc.titleComparison of the performance of slurries for STI processing
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage202
dc.source.endpage208
dc.source.conferenceProceedings 2nd International Chemical-Mechanical Polish (C.M.P.) for ULSI Multilevel Interconnection Conference - CMP-MIC
dc.source.conferencedate13/02/1997
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access


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