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A novel PEALD tunnel dielectric for three-dimensional non-volatile charge-trapping technology

dc.contributor.authorCacciato, Antonio
dc.contributor.authorBreuil, Laurent
dc.contributor.authorDekkers, Harold
dc.contributor.authorZahid, Mohammed
dc.contributor.authorKar, Gouri Sankar
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorSchoofs, Geert
dc.contributor.authorShi, Qixian
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorJurczak, Gosia
dc.contributor.authorDebusschere, Ingrid
dc.contributor.authorVan Houdt, Jan
dc.contributor.authorCockburn, Andrew
dc.contributor.authorDate, Lucien
dc.contributor.authorXa, Li Qun
dc.contributor.authorLe, Maggie
dc.contributor.authorLee, Won
dc.date.accessioned2021-10-19T12:41:32Z
dc.date.available2021-10-19T12:41:32Z
dc.date.issued2011
dc.identifier.issn1099-0062
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18635
dc.sourceIIOimport
dc.titleA novel PEALD tunnel dielectric for three-dimensional non-volatile charge-trapping technology
dc.typeJournal article
dc.contributor.imecauthorBreuil, Laurent
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorSchoofs, Geert
dc.contributor.imecauthorShi, Qixian
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorDebusschere, Ingrid
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.imecauthorCockburn, Andrew
dc.contributor.imecauthorDate, Lucien
dc.contributor.orcidimecBreuil, Laurent::0000-0003-2869-1651
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage271
dc.source.endpage273
dc.source.journalElectrochemical and Solid-State Letters
dc.source.issue7
dc.source.volume14
imec.availabilityPublished - open access


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