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SiGe, Ge and III-V materials and processes for beyond-Si CMOS and More-than-Moore applications

dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-19T12:43:01Z
dc.date.available2021-10-19T12:43:01Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18647
dc.sourceIIOimport
dc.titleSiGe, Ge and III-V materials and processes for beyond-Si CMOS and More-than-Moore applications
dc.typeProceedings paper
dc.contributor.imecauthorCaymax, Matty
dc.source.peerreviewno
dc.source.conferenceInternational Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors III
dc.source.conferencedate27/06/2011
dc.source.conferencelocationHong Kong China
imec.availabilityPublished - imec


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