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Ar-cluster beam profiling of material modifications in ion implanted deep ultraviolet photoresist

dc.contributor.authorConard, Thierry
dc.contributor.authorFranquet, Alexis
dc.contributor.authorTsvetanova, Diana
dc.contributor.authorMouhib, Tarik
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-19T12:54:12Z
dc.date.available2021-10-19T12:54:12Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18722
dc.sourceIIOimport
dc.titleAr-cluster beam profiling of material modifications in ion implanted deep ultraviolet photoresist
dc.typeMeeting abstract
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.source.peerreviewyes
dc.source.conference18th International Conference on Secondary Ion Mass Spectrometry - SIMS
dc.source.conferencedate18/09/2011
dc.source.conferencelocationRiva del Garda Italy
imec.availabilityPublished - imec


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