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Recent advances in fundamental understanding of reliability phenomena in downscaled copper interconnects

dc.contributor.authorCroes, Kristof
dc.contributor.authorWilson, Chris
dc.contributor.authorLofrano, Melina
dc.contributor.authorBeyer, Gerald
dc.contributor.authorTokei, Zsolt
dc.date.accessioned2021-10-19T12:59:28Z
dc.date.available2021-10-19T12:59:28Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18755
dc.sourceIIOimport
dc.titleRecent advances in fundamental understanding of reliability phenomena in downscaled copper interconnects
dc.typeOral presentation
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorLofrano, Melina
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.source.peerreviewno
dc.source.conferenceAdvanced Metallization Conference - ADMETA
dc.source.conferencedate13/09/2011
dc.source.conferencelocationTokio Japan
imec.availabilityPublished - imec


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