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Study of the reducing of defect density in STI etch process

dc.contributor.authorDanilkin, E.
dc.contributor.authorKozulin, R.
dc.contributor.authorPolyakov, A.
dc.contributor.authorTrutaeva, M.
dc.contributor.authorShamiryan, Denis
dc.contributor.authorIslyaykin, A.
dc.contributor.authorGutshin, O.P.
dc.date.accessioned2021-10-19T13:01:45Z
dc.date.available2021-10-19T13:01:45Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18768
dc.sourceIIOimport
dc.titleStudy of the reducing of defect density in STI etch process
dc.typeOral presentation
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference4th International Workshop on Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate5/05/2011
dc.source.conferencelocationMechelen Belgium
imec.availabilityPublished - open access


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