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SEM proximity effect for poly gate patterns

dc.contributor.authorFinders, Jo
dc.contributor.authorPotoms, Goedele
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.contributor.authorVan Driessche, Veerle
dc.contributor.authorTzviatkov, Plamen
dc.contributor.authorBruggeman, B.
dc.contributor.authorCaligiore, A.
dc.date.accessioned2021-09-30T08:16:39Z
dc.date.available2021-09-30T08:16:39Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1881
dc.sourceIIOimport
dc.titleSEM proximity effect for poly gate patterns
dc.typeJournal article
dc.contributor.imecauthorPotoms, Goedele
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.imecauthorVan Driessche, Veerle
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage5
dc.source.endpage10
dc.source.journalMicrolithography World
dc.source.issue4
dc.source.volume6
imec.availabilityPublished - open access


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