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Mechanisms for the trimethylaluminum reaction in aluminum oxide atomic layer deposition on sulfur passivated germanium

dc.contributor.authorDelabie, Annelies
dc.contributor.authorSioncke, Sonja
dc.contributor.authorRip, Jens
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorCaymax, Matty
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorPierloot, Kristine
dc.date.accessioned2021-10-19T13:12:18Z
dc.date.available2021-10-19T13:12:18Z
dc.date.issued2011
dc.identifier.issn1932-7447
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18823
dc.sourceIIOimport
dc.titleMechanisms for the trimethylaluminum reaction in aluminum oxide atomic layer deposition on sulfur passivated germanium
dc.typeJournal article
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.source.peerreviewyes
dc.source.beginpage17523
dc.source.endpage17532
dc.source.journalJournal of Physical Chemistry C
dc.source.issue35
dc.source.volume115
imec.availabilityPublished - imec


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