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Aluminium oxide atomic layer deposition on semiconductor substrates

dc.contributor.authorDelabie, Annelies
dc.contributor.authorSioncke, Sonja
dc.contributor.authorRip, Jens
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorMueller, Matthias
dc.contributor.authorBeckhoff, Burkhard
dc.contributor.authorPierloot, Kristine
dc.date.accessioned2021-10-19T13:12:31Z
dc.date.available2021-10-19T13:12:31Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18824
dc.sourceIIOimport
dc.titleAluminium oxide atomic layer deposition on semiconductor substrates
dc.typeProceedings paper
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage149
dc.source.endpage160
dc.source.conferencePhysics and Technology of High-k Materials 9
dc.source.conferencedate9/10/2011
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - open access
imec.internalnotesECS TRansactions; Vol. 41, Issue 3


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