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Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance

dc.contributor.authorDietze, Uwe
dc.contributor.authorDress, Peter
dc.contributor.authorWaehler, Tobias
dc.contributor.authorSingh, Sherjang
dc.contributor.authorJonckheere, Rik
dc.contributor.authorBaudemprez, Bart
dc.date.accessioned2021-10-19T13:16:59Z
dc.date.available2021-10-19T13:16:59Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18845
dc.sourceIIOimport
dc.titleEffective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage79850N
dc.source.conference27th European Mask and Lithography Conference - EMLC
dc.source.conferencedate18/01/2011
dc.source.conferencelocationDresden Germany
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE, Vol.7985


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