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Variability aware sub-wavelength lithography characterization for robust SRAM design

dc.contributor.authorDobrovolny, Petr
dc.contributor.authorMiranda Corbalan, Miguel
dc.contributor.authorZuber, Paul
dc.date.accessioned2021-10-19T13:17:50Z
dc.date.available2021-10-19T13:17:50Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18849
dc.sourceIIOimport
dc.titleVariability aware sub-wavelength lithography characterization for robust SRAM design
dc.typeProceedings paper
dc.contributor.imecauthorDobrovolny, Petr
dc.contributor.imecauthorZuber, Paul
dc.contributor.orcidimecDobrovolny, Petr::0000-0002-1465-481X
dc.source.peerreviewyes
dc.source.conference1st ERDIAP Workshop - Exploiting Regularity in the Design of IPs, Architectures and Platforms
dc.source.conferencedate23/02/2011
dc.source.conferencelocationComo Italy
imec.availabilityPublished - imec


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