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Sub-wavelength lithography and variability aware SRAM characterization

dc.contributor.authorDobrovolny, Petr
dc.contributor.authorMiranda Corbalan, Miguel
dc.contributor.authorZuber, Paul
dc.date.accessioned2021-10-19T13:18:02Z
dc.date.available2021-10-19T13:18:02Z
dc.date.issued2011-06
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18850
dc.sourceIIOimport
dc.titleSub-wavelength lithography and variability aware SRAM characterization
dc.typeProceedings paper
dc.contributor.imecauthorDobrovolny, Petr
dc.contributor.imecauthorZuber, Paul
dc.contributor.orcidimecDobrovolny, Petr::0000-0002-1465-481X
dc.source.peerreviewyes
dc.source.beginpage1
dc.source.endpage10
dc.source.conference18th Electronic Devices and Systems Conference - EDS
dc.source.conferencedate22/06/2011
dc.source.conferencelocationBrno Czech republic
dc.identifier.urlhttp://www.imaps.cz/eds2011
imec.availabilityPublished - imec


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