dc.contributor.author | Erdmann, Andreas | |
dc.contributor.author | Shao, Feng | |
dc.contributor.author | Evanschitzky, Peter | |
dc.contributor.author | Fuehner, Tim | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Goethals, Mieke | |
dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Bret, Tristan | |
dc.contributor.author | Hofmann, Thorsten | |
dc.date.accessioned | 2021-10-19T13:27:09Z | |
dc.date.available | 2021-10-19T13:27:09Z | |
dc.date.issued | 2011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/18889 | |
dc.source | IIOimport | |
dc.title | Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 81710M | |
dc.source.conference | Physical Optics | |
dc.source.conferencedate | 5/09/2011 | |
dc.source.conferencelocation | Marseille France | |
imec.availability | Published - open access | |
imec.internalnotes | SPIE proceedings; vol. 8171 | |