Show simple item record

Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects

dc.contributor.authorErdmann, Andreas
dc.contributor.authorShao, Feng
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorFuehner, Tim
dc.contributor.authorLorusso, Gian
dc.contributor.authorHendrickx, Eric
dc.contributor.authorGoethals, Mieke
dc.contributor.authorJonckheere, Rik
dc.contributor.authorBret, Tristan
dc.contributor.authorHofmann, Thorsten
dc.date.accessioned2021-10-19T13:27:09Z
dc.date.available2021-10-19T13:27:09Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18889
dc.sourceIIOimport
dc.titlePredictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage81710M
dc.source.conferencePhysical Optics
dc.source.conferencedate5/09/2011
dc.source.conferencelocationMarseille France
imec.availabilityPublished - open access
imec.internalnotesSPIE proceedings; vol. 8171


Files in this item

Thumbnail
Name:
23887.pdf
Size:
2.566Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record