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EUV baseline process optimizations for NXE:3100 evaluation

dc.contributor.authorFoubert, Philippe
dc.contributor.authorShite, Hideo
dc.contributor.authorNafus, Kathleen
dc.contributor.authorHermans, Jan
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-19T13:34:46Z
dc.date.available2021-10-19T13:34:46Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18920
dc.sourceIIOimport
dc.titleEUV baseline process optimizations for NXE:3100 evaluation
dc.typeProceedings paper
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate17/10/2011
dc.source.conferencelocationMiami, FL USA
imec.availabilityPublished - open access
imec.internalnotese-proceedings on sematech website


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