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Impact of post-litho linewidth roughness smoothing processes on the post-etch patterning result

dc.contributor.authorFoubert, Philippe
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-19T13:35:16Z
dc.date.available2021-10-19T13:35:16Z
dc.date.issued2011-07
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18922
dc.sourceIIOimport
dc.titleImpact of post-litho linewidth roughness smoothing processes on the post-etch patterning result
dc.typeJournal article
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorGronheid, Roel
dc.source.peerreviewyes
dc.source.beginpage33001
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue3
dc.source.volume10
dc.identifier.urlhttp://spiedigitallibrary.org/jm3/resource/1/jmmmgf/v10/i3/p033001_s1
imec.availabilityPublished - imec


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