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Application of an inverse Mack model for negative tone development simulation

dc.contributor.authorGao, Weimin
dc.contributor.authorKlostermann, Ulrich
dc.contributor.authorMülders, Thomas
dc.contributor.authorSchmoeller, Thomas
dc.contributor.authorDemmerle, Wolfgang
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorBekaert, Joost
dc.date.accessioned2021-10-19T13:40:31Z
dc.date.available2021-10-19T13:40:31Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18942
dc.sourceIIOimport
dc.titleApplication of an inverse Mack model for negative tone development simulation
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage79732W
dc.source.conferenceOptical Microlithography XXIV
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 7973


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