Show simple item record

Determining physical properties of EpoClad negative photoresist for use in MEMS applications

dc.contributor.authorGijsenbergh, Pieter
dc.contributor.authorWouters, Kristof
dc.contributor.authorVanstreels, Kris
dc.contributor.authorPuers, Robert
dc.date.accessioned2021-10-19T13:44:55Z
dc.date.available2021-10-19T13:44:55Z
dc.date.issued2011
dc.identifier.issn0960-1317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18958
dc.sourceIIOimport
dc.titleDetermining physical properties of EpoClad negative photoresist for use in MEMS applications
dc.typeJournal article
dc.contributor.imecauthorGijsenbergh, Pieter
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.orcidimecGijsenbergh, Pieter::0000-0003-0135-6968
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.source.peerreviewyes
dc.source.beginpage74001
dc.source.journalJournal of Micromechanics and Microengineering
dc.source.issue7
dc.source.volume21
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record