Show simple item record

Addressing the challenges of Directed Self Assembly implementation

dc.contributor.authorGronheid, Roel
dc.contributor.authorPollentier, Ivan
dc.contributor.authorYounkin, Todd
dc.contributor.authorSomervell, Mark
dc.contributor.authorNafus, Kathleen
dc.contributor.authorHooge, Josh
dc.contributor.authorRathsack, Ben
dc.contributor.authorScheer, Steven
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorNealy, Paul
dc.date.accessioned2021-10-19T14:00:40Z
dc.date.available2021-10-19T14:00:40Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19013
dc.sourceIIOimport
dc.titleAddressing the challenges of Directed Self Assembly implementation
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorScheer, Steven
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Lithography Extensions
dc.source.conferencedate20/10/2011
dc.source.conferencelocationMiami, FL USA
imec.availabilityPublished - open access
imec.internalnotese-proceedings on Sematech website


Files in this item

Thumbnail
Name:
22912.pdf
Size:
5.624Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record