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Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist

dc.contributor.authorGronheid, Roel
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorRathsack, Benjamin
dc.contributor.authorHooge, Joshua
dc.contributor.authorScheer, Steven
dc.contributor.authorNafus, Kathleen
dc.contributor.authorShite, Hideo
dc.contributor.authorKitano, Junichi
dc.date.accessioned2021-10-19T14:00:58Z
dc.date.available2021-10-19T14:00:58Z
dc.date.issued2011
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19014
dc.sourceIIOimport
dc.titleResolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist
dc.typeJournal article
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorScheer, Steven
dc.contributor.imecauthorNafus, Kathleen
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage13017
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue1
dc.source.volume10
imec.availabilityPublished - open access


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