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Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node

dc.contributor.authorGronheid, Roel
dc.contributor.authorYounkin, Todd
dc.contributor.authorLeeson, Michael J.
dc.contributor.authorFonseca, Carlos
dc.contributor.authorHooge, Joshua S.
dc.contributor.authorNafus, Kathleen
dc.contributor.authorBiafore, John J.
dc.contributor.authorSmith, Mark D.
dc.date.accessioned2021-10-19T14:01:15Z
dc.date.available2021-10-19T14:01:15Z
dc.date.issued2011
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19015
dc.sourceIIOimport
dc.titleExtreme-ultraviolet secondary electron blur at the 22-nm half pitch node
dc.typeJournal article
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorNafus, Kathleen
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage33004
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue3
dc.source.volume10
imec.availabilityPublished - open access


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