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EUV secondary electron blur at the 22nm half pitch node

dc.contributor.authorGronheid, Roel
dc.contributor.authorYounkin, Todd
dc.contributor.authorLeeson, Michael
dc.contributor.authorFonseca, Carlos
dc.contributor.authorHooge, Joshua
dc.contributor.authorNafus, Kathleen
dc.contributor.authorBiafore, John
dc.contributor.authorSmith, Mark D.
dc.date.accessioned2021-10-19T14:01:33Z
dc.date.available2021-10-19T14:01:33Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19016
dc.sourceIIOimport
dc.titleEUV secondary electron blur at the 22nm half pitch node
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorNafus, Kathleen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage796904
dc.source.conferenceExtreme Ultravioet (EUV) Lithography II
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE, Vol. 7969


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