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Photobase generator enabled pitch division: a progress report

dc.contributor.authorGu, Xinyu
dc.contributor.authorCho, Younjin
dc.contributor.authorKawakami, Takanori
dc.contributor.authorHagiwara, Yuji
dc.contributor.authorRawlings, Brandon
dc.contributor.authorMesch, Ryan
dc.contributor.authorOgata, Toshiyuki
dc.contributor.authorKim, Taeho
dc.contributor.authorSeshimo, Takehiro
dc.contributor.authorWang, Wade
dc.contributor.authorSundaresan, Arun K.
dc.contributor.authorTurro, Nicholas J.
dc.contributor.authorGronheid, Roel
dc.contributor.authorBlackwell, James M.
dc.contributor.authorBristol, Robert
dc.contributor.authorWilson, C. Grant
dc.date.accessioned2021-10-19T14:02:08Z
dc.date.available2021-10-19T14:02:08Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19018
dc.sourceIIOimport
dc.titlePhotobase generator enabled pitch division: a progress report
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage7972-14
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXVIII
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol.7972


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