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dc.contributor.authorGuerrero, Douglas
dc.contributor.authorOuattara, Tantiboro
dc.contributor.authorPollentier, Ivan
dc.contributor.authorLokasani, Ragava
dc.date.accessioned2021-10-19T14:02:41Z
dc.date.available2021-10-19T14:02:41Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19020
dc.sourceIIOimport
dc.titleOutgassing studies on EUV underlayers containing PAGs
dc.typeProceedings paper
dc.contributor.imecauthorGuerrero, Douglas
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate17/10/2011
dc.source.conferencelocationMiami USA
imec.availabilityPublished - open access
imec.internalnotese-proceedings on Sematech website


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