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Calibration studies of pattern top resist loss detection by CD-SEM for advanced lithography process

dc.contributor.authorIshimoto, Toru
dc.contributor.authorIsawa, Miki
dc.contributor.authorTanaka, Maki
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-19T14:28:56Z
dc.date.available2021-10-19T14:28:56Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19109
dc.sourceIIOimport
dc.titleCalibration studies of pattern top resist loss detection by CD-SEM for advanced lithography process
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage79712H
dc.source.conferenceMetrology, Inspection, and Process Control XXV
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol.7971


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