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Repair of natural EUV reticle defects

dc.contributor.authorJonckheere, Rik
dc.contributor.authorBret, Tristan
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorMagana, John F.
dc.contributor.authorGao, Weimin
dc.contributor.authorWaiblinger, Markus
dc.date.accessioned2021-10-19T14:37:37Z
dc.date.available2021-10-19T14:37:37Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19137
dc.sourceIIOimport
dc.titleRepair of natural EUV reticle defects
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage81661G
dc.source.conferencePhotomask technology 2011
dc.source.conferencedate19/09/2011
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 8166


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