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Influence of environments on the footprint of particle contamination on EUV mask

dc.contributor.authorKim, Tae-Gon
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorKesters, Els
dc.contributor.authorStruyf, Herbert
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-19T14:51:17Z
dc.date.available2021-10-19T14:51:17Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19179
dc.sourceIIOimport
dc.titleInfluence of environments on the footprint of particle contamination on EUV mask
dc.typeMeeting abstract
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage79690L
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography II
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 7969


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