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Calibration of physical resist models for simulation of extreme ultraviolet lithography

dc.contributor.authorKlostermann, Ulrich K.
dc.contributor.authorMuelders, Thomas
dc.contributor.authorSchmoeller, Thomas
dc.contributor.authorLorusso, Gian
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-19T14:53:08Z
dc.date.available2021-10-19T14:53:08Z
dc.date.issued2011
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19185
dc.sourceIIOimport
dc.titleCalibration of physical resist models for simulation of extreme ultraviolet lithography
dc.typeJournal article
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHendrickx, Eric
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage13007
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue1
dc.source.volume10
imec.availabilityPublished - open access


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