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dc.contributor.authorKoelling, Sebastian
dc.contributor.authorZschaetzsch, Gerd
dc.contributor.authorDouhard, Bastien
dc.contributor.authorKimura, K
dc.contributor.authorBuyuklimanli, T.
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-19T14:55:43Z
dc.date.available2021-10-19T14:55:43Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19193
dc.sourceIIOimport
dc.titleHigh resolution analysis of high concentration dopant profiles
dc.typeOral presentation
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference18th International Conference on Secondary Ion Mass Spectrometry - SIMS XXVIII
dc.source.conferencedate19/09/2011
dc.source.conferencelocationRiva del Garda Italy
imec.availabilityPublished - open access


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