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Integrated diffusion-recombination model for describing the logarithic time dependency of plasma damage in porous low-k materials

dc.contributor.authorKunnen, Eddy
dc.contributor.authorBarkema, Gerard
dc.contributor.authorMaes, Christian
dc.contributor.authorShamiryan, Denis
dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorStruyf, Herbert
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-19T15:00:43Z
dc.date.available2021-10-19T15:00:43Z
dc.date.issued2011
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19207
dc.sourceIIOimport
dc.titleIntegrated diffusion-recombination model for describing the logarithic time dependency of plasma damage in porous low-k materials
dc.typeJournal article
dc.contributor.imecauthorStruyf, Herbert
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage631
dc.source.endpage634
dc.source.journalMicroelectronic Engineering
dc.source.issue5
dc.source.volume88
imec.availabilityPublished - open access


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