Show simple item record

Contact edge roughness: effects of dose and PAG concentration in EUV lithography

dc.contributor.authorKuppuswamy, Vijaya Kumar Murugesan
dc.contributor.authorConstantoudis, Vassilios
dc.contributor.authorGogolides, Evangelos
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-19T15:01:01Z
dc.date.available2021-10-19T15:01:01Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19208
dc.sourceIIOimport
dc.titleContact edge roughness: effects of dose and PAG concentration in EUV lithography
dc.typeOral presentation
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference37th International Conference on Micro and Nano Engineering - MNE
dc.source.conferencedate19/09/2011
dc.source.conferencelocationBerlin Germany
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
24135.pdf
Size:
790.2Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record