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Anisotropic etching of inverted pyramids in the sub-100 nm region

dc.contributor.authorHantschel, Thomas
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-09-30T08:23:58Z
dc.date.available2021-09-30T08:23:58Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1920
dc.sourceIIOimport
dc.titleAnisotropic etching of inverted pyramids in the sub-100 nm region
dc.typeJournal article
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage405
dc.source.endpage407
dc.source.journalMicroelectronic Engineering
dc.source.volume33
imec.availabilityPublished - open access


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