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Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

dc.contributor.authorLawrie, Kirsten J.
dc.contributor.authorBlakey, Idriss
dc.contributor.authorBlinco, James P.
dc.contributor.authorCheng, Han Hao
dc.contributor.authorGronheid, Roel
dc.contributor.authorJack, Kevin S.
dc.contributor.authorPollentier, Ivan
dc.contributor.authorLeeson, Michael J.
dc.contributor.authorYounkin, Todd
dc.contributor.authorWhittaker, Andrew K.
dc.date.accessioned2021-10-19T15:15:21Z
dc.date.available2021-10-19T15:15:21Z
dc.date.issued2011
dc.identifier.issn0959-9428
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19252
dc.sourceIIOimport
dc.titleChain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers
dc.typeJournal article
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage5629
dc.source.endpage5637
dc.source.journalJournal of Materials Chemistry
dc.source.issue15
dc.source.volume21
imec.availabilityPublished - open access


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