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Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers
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Authors
Lawrie, Kirsten J.
;
Blakey, Idriss
;
Blinco, James P.
;
Cheng, Han Hao
;
Gronheid, Roel
;
Jack, Kevin S.
;
Pollentier, Ivan
;
Leeson, Michael J.
;
Younkin, Todd
;
Whittaker, Andrew K.
ISSN
0959-9428
Issue
15
Journal
Journal of Materials Chemistry
Volume
21
Title
Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers
Publication type
Journal article
Embargo date
9999-12-31
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