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Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers
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Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers
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Date
2011
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lawrie, Kirsten J.
;
Blakey, Idriss
;
Blinco, James P.
;
Cheng, Han Hao
;
Gronheid, Roel
;
Jack, Kevin S.
;
Pollentier, Ivan
;
Leeson, Michael J.
;
Younkin, Todd
;
Whittaker, Andrew K.
Journal
Journal of Materials Chemistry
Abstract
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1973
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Acq. date: 2025-12-11
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Metrics
Views
1973
since deposited on 2021-10-19
1
last month
1
last week
Acq. date: 2025-12-11
Citations