Publication:

Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

Date

2011
Journal article
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dc.contributor.authorLawrie, Kirsten J.
dc.contributor.authorBlakey, Idriss
dc.contributor.authorBlinco, James P.
dc.contributor.authorCheng, Han Hao
dc.contributor.authorGronheid, Roel
dc.contributor.authorJack, Kevin S.
dc.contributor.authorPollentier, Ivan
dc.contributor.authorLeeson, Michael J.
dc.contributor.authorYounkin, Todd
dc.contributor.authorWhittaker, Andrew K.
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned2021-10-19T15:15:21Z
dc.date.available2021-10-19T15:15:21Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.issn0959-9428
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19252
dc.source.beginpage5629
dc.source.endpage5637
dc.source.issue15
dc.source.journalJournal of Materials Chemistry
dc.source.volume21
dc.title

Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

dc.typeJournal article
dspace.entity.typePublication
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