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Atomic layer deposition of HfO2 on single walled carbon nanotubes

dc.contributor.authorLiyanage, Lucky
dc.contributor.authorCott, Daire
dc.contributor.authorDelabie, Annelies
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorWong, Philip
dc.date.accessioned2021-10-19T15:40:00Z
dc.date.available2021-10-19T15:40:00Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19323
dc.sourceIIOimport
dc.titleAtomic layer deposition of HfO2 on single walled carbon nanotubes
dc.typeOral presentation
dc.contributor.imecauthorCott, Daire
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewno
dc.source.conferenceWorkshop on Graphene and Carbon Nanotubes
dc.source.conferencedate23/09/2011
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - imec


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