dc.contributor.author | Loo, Roger | |
dc.contributor.author | Souriau, Laurent | |
dc.contributor.author | Ong, Patrick | |
dc.contributor.author | Kenis, Karine | |
dc.contributor.author | Rip, Jens | |
dc.contributor.author | Peter, Storck | |
dc.contributor.author | Buschhardt, Thomas | |
dc.contributor.author | Vorderwestner, Martin | |
dc.date.accessioned | 2021-10-19T15:43:28Z | |
dc.date.available | 2021-10-19T15:43:28Z | |
dc.date.issued | 2011 | |
dc.identifier.issn | 0022-0248 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/19333 | |
dc.source | IIOimport | |
dc.title | Smooth and high quality epitaxial strained Ge grown on siGe strain relaxed buffers with 70-80% Ge | |
dc.type | Journal article | |
dc.contributor.imecauthor | Loo, Roger | |
dc.contributor.imecauthor | Souriau, Laurent | |
dc.contributor.imecauthor | Ong, Patrick | |
dc.contributor.imecauthor | Kenis, Karine | |
dc.contributor.imecauthor | Rip, Jens | |
dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
dc.contributor.orcidimec | Souriau, Laurent::0000-0002-5138-5938 | |
dc.contributor.orcidimec | Ong, Patrick::0000-0002-2072-292X | |
dc.source.peerreview | yes | |
dc.source.beginpage | 15 | |
dc.source.endpage | 21 | |
dc.source.journal | Journal of Crystal Growth | |
dc.source.issue | 1 | |
dc.source.volume | 324 | |
imec.availability | Published - imec | |