Publication:
Smooth and high quality epitaxial strained Ge grown on siGe strain relaxed buffers with 70-80% Ge
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1889 since deposited on 2021-10-19
1last month
Acq. date: 2026-06-07
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Statistics
Views
1889 since deposited on 2021-10-19
1last month
Acq. date: 2026-06-07
Citations