Show simple item record

Deep ultraviolet out-of-band contribution in extreme ultraviolet lithography: predictions and experiments

dc.contributor.authorLorusso, Gian
dc.contributor.authorDavydova, Natalia
dc.contributor.authorEurlings, Mark
dc.contributor.authorKaya, Cemil
dc.contributor.authorPeng, Yue
dc.contributor.authorFeenstra, Kees
dc.contributor.authorFedynyshyn, Theodore H.
dc.contributor.authorNatt, Oliver
dc.contributor.authorHuber, Peter
dc.contributor.authorZaczek, Christoph
dc.contributor.authorYoung, Stuart
dc.contributor.authorGraeupner, Paul
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-19T15:45:51Z
dc.date.available2021-10-19T15:45:51Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19339
dc.sourceIIOimport
dc.titleDeep ultraviolet out-of-band contribution in extreme ultraviolet lithography: predictions and experiments
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorPeng, Yue
dc.contributor.imecauthorHendrickx, Eric
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage79692O
dc.source.conferenceExtreme Utltraviolet (EUV) Lithography II
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesSPIE Proceedings, Vol. 7969


Files in this item

Thumbnail
Name:
21277.pdf
Size:
149.6Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record