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Optimization of post ion implant ash plasma and clean for ultra shallow extension/halo implantation

dc.contributor.authorMannaert, Geert
dc.contributor.authorSchram, Tom
dc.contributor.authorOrtolland, Claude
dc.contributor.authorDemand, Marc
dc.contributor.authorSonnemans, Roger
dc.contributor.authorBerry, Ivan
dc.date.accessioned2021-10-19T15:59:43Z
dc.date.available2021-10-19T15:59:43Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19376
dc.sourceIIOimport
dc.titleOptimization of post ion implant ash plasma and clean for ultra shallow extension/halo implantation
dc.typeMeeting abstract
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorDemand, Marc
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.source.peerreviewno
dc.source.conference4th International Workshop on Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate5/05/2011
dc.source.conferencelocationMechelen Belgium
dc.identifier.urlhttp://www.pesm2011.be/Pesm2011/online_presentations_5may.html
imec.availabilityPublished - imec


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