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SEG Si: facet control and selectivity vs. nitride and oxide pattern

dc.contributor.authorHoward, Dave
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-09-30T08:27:15Z
dc.date.available2021-09-30T08:27:15Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1937
dc.sourceIIOimport
dc.titleSEG Si: facet control and selectivity vs. nitride and oxide pattern
dc.typeOral presentation
dc.contributor.imecauthorCaymax, Matty
dc.source.peerreviewno
dc.source.conferenceMaterials Research Society 1997 Spring Meeting : Symposium on Epitaxial Growth - Principles and Applications; March 31 - April 2
dc.source.conferencelocation
imec.availabilityPublished - imec


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