dc.contributor.author | Martens, Koen | |
dc.contributor.author | Radu, Iuliana | |
dc.contributor.author | Mertens, Sofie | |
dc.contributor.author | Shi, Xiaoping | |
dc.contributor.author | Schaekers, Marc | |
dc.contributor.author | Tielens, Hilde | |
dc.contributor.author | Huyghebaert, Cedric | |
dc.contributor.author | De Gendt, Stefan | |
dc.contributor.author | Jurczak, Gosia | |
dc.contributor.author | Afanas'ev, Valerie | |
dc.contributor.author | Heyns, Marc | |
dc.contributor.author | Kittl, Jorge | |
dc.date.accessioned | 2021-10-19T16:07:15Z | |
dc.date.available | 2021-10-19T16:07:15Z | |
dc.date.issued | 2011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/19395 | |
dc.source | IIOimport | |
dc.title | Electrical characterization of the metal-vanadium dioxide interface and vanadium dioxide work function | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Martens, Koen | |
dc.contributor.imecauthor | Radu, Iuliana | |
dc.contributor.imecauthor | Mertens, Sofie | |
dc.contributor.imecauthor | Schaekers, Marc | |
dc.contributor.imecauthor | Tielens, Hilde | |
dc.contributor.imecauthor | Huyghebaert, Cedric | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.imecauthor | Jurczak, Gosia | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | Martens, Koen::0000-0001-7135-5536 | |
dc.contributor.orcidimec | Radu, Iuliana::0000-0002-7230-7218 | |
dc.contributor.orcidimec | Mertens, Sofie::0000-0002-1482-6730 | |
dc.contributor.orcidimec | Schaekers, Marc::0000-0002-1496-7816 | |
dc.contributor.orcidimec | Huyghebaert, Cedric::0000-0001-6043-7130 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.source.peerreview | no | |
dc.source.conference | IEEE Semiconductor Interface Specialist Conference - SISC | |
dc.source.conferencedate | 1/12/2011 | |
dc.source.conferencelocation | Washington, DC USA | |
imec.availability | Published - imec | |