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CMP of Ge and InP for microelectronic applications

dc.contributor.authorOng, Patrick
dc.contributor.authorPeddeti, Shivaji
dc.contributor.authorLeunissen, Peter
dc.contributor.authorBabu, S.V.
dc.date.accessioned2021-10-19T16:54:11Z
dc.date.available2021-10-19T16:54:11Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19512
dc.sourceIIOimport
dc.titleCMP of Ge and InP for microelectronic applications
dc.typeOral presentation
dc.contributor.imecauthorOng, Patrick
dc.contributor.orcidimecOng, Patrick::0000-0002-2072-292X
dc.source.peerreviewno
dc.source.conference16th International Symposium on Chemical-Mechanical Planarization
dc.source.conferencedate7/08/2011
dc.source.conferencelocationLake Placid, NY USA
imec.availabilityPublished - imec


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