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Impact of EUV off-axis illumination on full field imaging performance for NXE:3100

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorPhilippou, Alexander
dc.contributor.authorKlostermann, Ulrich
dc.contributor.authorGao, Weimin
dc.date.accessioned2021-10-19T17:20:10Z
dc.date.available2021-10-19T17:20:10Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19574
dc.sourceIIOimport
dc.titleImpact of EUV off-axis illumination on full field imaging performance for NXE:3100
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate17/10/2011
dc.source.conferencelocationMiami, FL USA
imec.availabilityPublished - open access
imec.internalnotese-proceedings on Sematech website


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