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Bridging lithography processes with NAND flash ECC complexity

dc.contributor.authorPoliakov, Pavel
dc.contributor.authorBlomme, Pieter
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorMiranda Corbalan, Miguel
dc.contributor.authorVan Houdt, Jan
dc.contributor.authorDehaene, Wim
dc.date.accessioned2021-10-19T17:24:32Z
dc.date.available2021-10-19T17:24:32Z
dc.date.issued2011-06
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19585
dc.sourceIIOimport
dc.titleBridging lithography processes with NAND flash ECC complexity
dc.typeProceedings paper
dc.contributor.imecauthorBlomme, Pieter
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.imecauthorDehaene, Wim
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.source.peerreviewyes
dc.source.beginpage161
dc.source.endpage164
dc.source.conference3rd International Memory Workshop - IMW
dc.source.conferencedate22/05/2011
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec


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