Unraveling the effect of resist composition on EUV optics contamination

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Authors
Pollentier, Ivan; Neira, Imanol; Goethals, Mieke; Gronheid, Roel; Tarutani, S.; Tamaoki, H.; Takahashi, T.; Tsubaki, H.
Conference
Extreme Ultraviolet (EUV) Lithography II
Title
Unraveling the effect of resist composition on EUV optics contamination
Publication type
Proceedings paper
Embargo date
9999-12-31
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