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dc.contributor.authorPollentier, Ivan
dc.contributor.authorNeira, Imanol
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-19T17:25:43Z
dc.date.available2021-10-19T17:25:43Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19588
dc.sourceIIOimport
dc.titleAssessment of resist outgassing related EUV optics contamination for CAR and non-CAR material chemistries
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage797208
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXVIII
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE, Vol.7972


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