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EUV outgassing and contamination in multilayer material schemes

dc.contributor.authorPollentier, Ivan
dc.contributor.authorTruffert, Vincent
dc.contributor.authorLokasani, Ragava
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-19T17:26:07Z
dc.date.available2021-10-19T17:26:07Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19589
dc.sourceIIOimport
dc.titleEUV outgassing and contamination in multilayer material schemes
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate17/10/2011
dc.source.conferencelocationMiami, FL USA
imec.availabilityPublished - open access
imec.internalnotese-proceedings on Sematech-website


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