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Improved EOT and leakage current for metal-insulator-metal capacitor stacks with rutile TiO2

dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorKim, Min-Soo
dc.contributor.authorTomida, Kazuyuki
dc.contributor.authorSwerts, Johan
dc.contributor.authorTielens, Hilde
dc.contributor.authorMoussa, Alain
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorFranquet, Alexis
dc.contributor.authorConard, Thierry
dc.contributor.authorAltimime, Laith
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorKittl, Jorge
dc.date.accessioned2021-10-19T17:30:43Z
dc.date.available2021-10-19T17:30:43Z
dc.date.issued2011
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19600
dc.sourceIIOimport
dc.titleImproved EOT and leakage current for metal-insulator-metal capacitor stacks with rutile TiO2
dc.typeJournal article
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorKim, Min-Soo
dc.contributor.imecauthorTomida, Kazuyuki
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecKim, Min-Soo::0000-0003-0211-0847
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1517
dc.source.endpage1520
dc.source.journalMicroelectronic Engineering
dc.source.issue7
dc.source.volume88
dc.identifier.urlhttp://dx.doi.org/10.1016/j.mee.2011.03.063
imec.availabilityPublished - open access
imec.internalnotesINFOS 2011 special issue


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