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The bottom-up copper fill of Ø5μm × 40μm vias using 2-component model chemistry
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Authors
Radisic, Alex
;
Yang, Liu
;
Drijbooms, Chris
;
Bender, Hugo
Conference
220th ECS Fall Meeting Symposium E5 - Processing Materials of 3D Interconnects, Damascene and Electronics Packaging
Title
The bottom-up copper fill of Ø5μm × 40μm vias using 2-component model chemistry
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Meeting abstract
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